Rsuwei AGS Wafer Gap Measurement System features a negative film material made of anodized aluminum, offering excellent durability. It is suitable for 300MM wafer machine processes and is equipped with a dedicated calibration platform. Under vacuum conditions, it provides rapid non-contact gap measurements for thin film, etching, and sputtering processes, effectively ensuring data consistency and improving production efficiency.

The system comes with its self-developed professional AGS software, which measures the gap at three points to adjust the equipment to an ideal state. The gap measurement accuracy can reach ±0.025mm.

With the dedicated AGS calibration platform, accurate data can be obtained for each measurement, enabling every engineer to set the same gap. This effectively avoids measurement variations caused by different technicians, ensuring consistency and repeatability in gap adjustments.

Engineers can use the AGS system software to view real-time data and adjustment effects inside the vacuum process chamber, achieving on-site real-time feedback and reducing equipment calibration time. Automated operations can speed up setup, maintenance, and troubleshooting, saving both time and labor costs.

Equipped with wireless charging and Bluetooth transmission, the system offers a battery life of up to 2.5 hours.