On-Wafer Monitoring Sensor For Low Temperature
On-Wafer Monitoring Sensor For Low Temperature Process
- Wafer size: 8″, 12″
- Temperature precision: ±0.1℃-0.2℃
- Temperature measure range: -40-40℃
- Number of measurement point: 1~81
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Product Introduction
On-Wafer Monitoring Sensor For Low Temperature
On-Wafer Temperature Monitoring System is suitable for wafer temperature measurement during low-temperature dry etching, with a measurement range of -40 to 40℃. It achieves maximum accuracy in monitoring the temperature of dry etching processes.
It can be used for temperature measurement under plasma-on conditions, detecting the impact of temperature on wafers in plasma environments. The system effectively shields against electromagnetic interference and improves temperature measurement accuracy.
The temperature sensors can reach up to 81 units, and the number of sensors can be customized. Wafer sizes of 8-inch and 12-inch are available as options.
The system allows offline data collection. Its specialized supporting software can quickly analyze the maximum, minimum, and average temperatures, saving engineers significant time and effort in data analysis.
Features:
- EMI/RFI Shielding
- Wireless Data Collection
- High Accuracy & Resolution
- Thermal Maps
- Time-Temperature Traces
- Analysis Software
Specifications
| Item No. | Item | Data |
| 1 | Wafer size | 8”，12” |
| 2 | Wafer material | Silicon |
| 3 | Surface material | Silicon |
| 4 | Number of measurement point | 49/65/81 |
| 5 | Sensor type | IC |
| 6 | Temperature test range | -40-40℃ |
| Wet Clean: 15-120℃ | ||
| 8 | Precision | 0.1℃/0.2℃ |
| 9 | Thickness | 1.2mm |
| 10 | Connection | RF |
| 11 | Power | battery |
| 12 | Charge | bluetooth |
| 13 | Sampling frequency | 1Hz/2Hz/4Hz |
| 14 | Application | Wet clean, Dry Etch |
Software demostration Interface
Applications
Low-temp Etcher
Customization
Please provide your RFQs:
– Wafer Size
– Test precision
– Test temperature range
– Process type
– Whether there is ESC, plasma, RF condition